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Symbiotic Optimization of the Nanolithography and RF-Plasma Etching for Fabricating High-Quality Light-Sensitive Superconductors on the 50 nm Scale
Symbiotic Optimization Nanolithography High-Quality Light-Sensitive Superconductors
2010/11/24
We present results of a fabrication-process development for the lithographic pattern transfer into the nm100sub range by combining electron-beam lithography and reactive dry etching to obtain ...
Plasma Characterization of Pulsed-Laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition
Plasma Characterization Pulsed-Laser Ablation Process Fullerene-like CNx Thin Film Deposition
2010/10/27
Plasma Characterization of Pulsed-Laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition.
Description and Characterization of a ECR Plasma Device Developed for Thin Film Deposition
a ECR Plasma Device Thin Film Deposition
2010/10/27
The design, construction, and characterization of an electron-cyclotron-resonance (ECR) plasma device and its utilization for growing AlN polycrystals are described in detail. The plasma density and e...