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Fabrication and characterization of a Ni-Mn-Ga uniaxially textured freestanding film deposited by DC magnetron sputtering
DC magnetron sputtering freestanding Ni-Mn-Ga thick film martensitic transformation
2010/11/22
Homogeneous freestanding films have been obtained by the direct current (DC) magnetron sputtering technique using a sacrificial layer. After annealing, the films are crystallized with a strong out-of-...
Tuning macro-twinned domain sizes and the b-variants content of the adaptive 14-modulated martensite in epitaxial Ni-Mn-Ga films by co-sputtering
Magnetic shape memory alloys epitaxial films adaptive modulated-martensites twinning
2010/11/19
order to obtain modulated-martensite in our epitaxial Ni-Mn-Ga films, we have tuned the composition by using a co-sputtering process. Here we present how the composition affects the variant distributi...
Hydrogen Influence on Gallium Arsenide Thin Films Prepared by RF-Magnetron Sputtering Technique
Hydrogen Gallium arsenide RF-magnetron sputtering
2010/9/29
We investigate the effect of the hydrogen intentional incorporation on the structural properties of the amorphous gallium arsenide prepared by rf-magnetron sputtering technique. The properties of the ...
Electrical and Morphological Properties of Low Resistivity Mo thin Films Prepared by Magnetron Sputtering
Mo Thin films Solar cells CIGS Low resistivity
2010/9/29
Mo thin films have been deposited using a DC magnetron sputtering system with an S-gun configuration electrode and characterized electrically and morphologically. The influence of the sputtering gas p...
Nanocrystalline GaN and GaN:H Films Grown by RF-Magnetron Sputtering
GaN GaN:H Nanocrystalline Sputtering Hydrogenation
2010/9/29
The structural and optical properties of nanocrystalline GaN and GaN:H films grown by RF-magnetron sputtering are focused here. The films were grown using a Ga target and a variety of deposition param...