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Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
EUV Masks EUV-Scatterometry Finite Element Analysis
2010/11/16
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) novel reflective mas...