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Academy of Mathematics and Systems Science, CAS Colloquia & Seminars：Cooperation between Coherent Control and Noises in Quantum Metrology
量子计量 相干控制 噪声
2023/11/7
In this work, the cooperation between coherent control and noises in open spin systems is studied, aiming to demonstrate that such cooperation can provide new possibilities for parametrization in quan...
2017年量子检测，计量和设备研讨会（Symposium ED12—Quantum Sensing,Metrology and Devices）
2017年 量子检测，计量和设备 研讨会
2017/1/13
The symposium addresses key progress in the field on Quantum sensing. It is now becoming apparent that quantum-spin and photon manipulation techniques using solid-state qubits can be used for ultrapre...
2017年SPIE微光刻的计量，检查和过程控制会议（Metrology,Inspection,and Process Control for Microlithography XXXI）
2017年 SPIE微光刻的计量，检查和过程控制 会议
2017/1/12
Review conference details by clicking on the titles below. These details include paper titles, authors, schedules and abstracts. View Proceedings from last year.SPIE conference papers are published in...
Quantum Metrology with Dicke Squeezed States
quantum metrology Dicke squeezed state entanglement
2016/1/22
We introduce a new class of quantum many-particle entangled states, called the Dicke squeezed (or DS) states, which can be used to improve the precision in quantum metrology beyond the standard quantu...
LASER SCANNING AND PHOTOGRAMMETRY: 21ST CENTURY METROLOGY
laser scanning photogrammetry integration
2015/3/6
New technologies often turn heads the first time they appear. Laser scanning is one such new technique, which has
impressed many users by the ability of point clouds to provide an understanding of c...
Metrology of EUV Masks by EUV-Scatterometry and Finite Element Analysis
EUV Masks EUV-Scatterometry Finite Element Analysis
2010/11/16
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) novel reflective mas...
Interface Trap Density Metrology of state-of-the-art undoped Si n-FinFETs
Interface Trap Density Metrology state-of-the-art undoped Si n-FinFETs
2010/11/22
The presence of interface states at the MOS interface is a well-known cause of device gradation.This is particularly true for ultra-scaled FinFET geometries where the presence of a few traps can stron...
Quantum metrology to probe atomic parity nonconservation
Quantum metrology probe atomic parity nonconservation
2010/10/29
An entangled state prepared in a decoherence free sub-space together with a Ramsey type measurement can probe parity violation in heavy alkali ions like Ba+ or Ra+. Here we propose an experiment with ...
Parity Measurements in Quantum Optical Metrology
Parity Measurements Quantum Optical Metrology
2010/4/9
We investigate the utility of parity detection to achieve Heisenberg-limited phase estimation for optical interferometry. We consider the parity detection with several input states that have been show...
An entangled state prepared in the decoherence free sub-space together with a Ramsey type measurement can probe parity violation in heavy alkali ions like Ba+ or Ra+. Here I propose an experiment with...