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Scientists have greatly expanded the range of functional temperatures for ferroelectrics, a key material used in a variety of everyday applications, by creating the first-ever polarization gradient in...
Plasma Characterization of Pulsed-Laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition
Plasma Characterization Pulsed-Laser Ablation Process Fullerene-like CNx Thin Film Deposition
2010/10/27
Plasma Characterization of Pulsed-Laser Ablation Process Used for Fullerene-like CNx Thin Film Deposition.
Description and Characterization of a ECR Plasma Device Developed for Thin Film Deposition
a ECR Plasma Device Thin Film Deposition
2010/10/27
The design, construction, and characterization of an electron-cyclotron-resonance (ECR) plasma device and its utilization for growing AlN polycrystals are described in detail. The plasma density and e...