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Hydrogen Influence on Gallium Arsenide Thin Films Prepared by RF-Magnetron Sputtering Technique
Hydrogen Gallium arsenide RF-magnetron sputtering
2010/9/29
We investigate the effect of the hydrogen intentional incorporation on the structural properties of the amorphous gallium arsenide prepared by rf-magnetron sputtering technique. The properties of the ...
Influence of the Substrate Bias Voltage on the Crystallographic Structure and Surface Composition of Ti6A14V Thin Films Deposited by rf Magnetron Sputtering
Sputtering Bias Steel
2010/9/29
In this work, the influence of the substrate bias on the crystalline structure and surface composition of Ti6Al4V thin films prepared by rf magnetron sputtering were studied. Samples were grown onto t...
Nanocrystalline GaN and GaN:H Films Grown by RF-Magnetron Sputtering
GaN GaN:H Nanocrystalline Sputtering Hydrogenation
2010/9/29
The structural and optical properties of nanocrystalline GaN and GaN:H films grown by RF-magnetron sputtering are focused here. The films were grown using a Ga target and a variety of deposition param...